Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1992-04-01
1994-10-25
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430168, 430191, 430192, 430193, G03F 7023
Patent
active
053588231
ABSTRACT:
A radiation-sensitive composition is disclosed comprising a polymeric binder which is insoluble in water, but soluble or at least swellable in aqueous alkaline solution and a 2,3,4,4'-tetrahydroxybenzophenone which is partially esterified with (1,2-naphthoquinone 2-diazide)-4- and/or -5-sulfonic acid, which additionally contains either a dihydroxybenzophenone which is completely esterified with (1,2-naphthoquinone 2-diazide)-4- and/or -5-sulfonic acid or a trihydroxybenzophenone which is partially or completely esterified with (1,2-naphthoquinone 2-diazide)-4- and/or -5-sulfonic acid. The weight ratio of esterified 2,3,4,4'-tetrahydroxybenzophenone to esterified di- or trihydroxybenzophenone varies between about 4:6 and 7:3 and the esterified hydroxybenzophenones, as a whole, are present in a proportion of 5 to 40% by weight, based on the total weight of solids contained in the composition. Also disclosed is a radiation-sensitive recording material comprising a support and a layer containing this composition, which is present on the support.
REFERENCES:
patent: 4871645 (1989-10-01), Uenishi et al.
patent: 5143814 (1992-09-01), Pampalone
Kosar, "Light-Sensitive Systems", John Wiley & Sons, New York, 1965 pp. 336-353.
H. Munzel et al., Microelectronic Engineering, vol. 6, 1987, pp. 421-426.
P. Trefonas III et al., SPIE Advances in Resist Technology and Processing IV, vol. 771, pp. 194-210 (1987).
Erdmann Fritz
Merrem Hans-Joachim
Schmitt Axel
Zahn Wolfgang
Bowers Jr. Charles L.
Hoechst Aktiengesellschaft
Young Christopher G.
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