Radiation-sensitive composition containing a resole resin and a

Details Radiation-sensitive composition containing a resole resin and a Radiation-sensitive composition containing a resole resin and a

1994-03-01

1994-12-13

Baxter, Janet C.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

430176, 430270, 430271, 430278, 430302, 430309, 430920, 430926, G03F 7004, G03F 7016, G03C 177

Patent

active

053729072

ABSTRACT:
A radiation-sensitive composition especially adapted to prepare a lithographic printing plate that is sensitive to both ultraviolet and infrared radiation and capable of functioning in either a positive-working or negative-working manner is comprised of (1) a resole resin, (2) a novolac resin, (3) a latent Bronsted acid and (4) an infrared absorber. The solubility of the composition in aqueous alkaline developing solution is both reduced in exposed areas and increased in unexposed areas by the steps of imagewise exposure to activating radiation and heating.

REFERENCES:
patent: 4247611 (1981-01-01), Sander et al.
patent: 4693958 (1987-09-01), Schwartz et al.
patent: 4708925 (1987-11-01), Newman
patent: 4927741 (1990-05-01), Garth et al.
patent: 5085972 (1992-02-01), Vogel

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