Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1995-09-26
1997-09-02
Lesmes, George F.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
4302701, 430302, 4302711, 430157, 430920, 430926, G03L 173
Patent
active
056630379
ABSTRACT:
A radiation-sensitive composition especially adapted to prepare a lithographic printing plate that is sensitive to both ultraviolet and infrared radiation and capable of functioning in either a positive-working or negative-working manner is comprised of (1) a resole resin, (2) a novolac resin, (3) a haloalkyl-substituted s-triazine and (4) an infrared absorber. The solubility of the composition in aqueous alkaline developing solution is both reduced in exposed areas and increased in unexposed areas by the steps of imagewise exposure to activating radiation and heating.
REFERENCES:
patent: 3779778 (1973-12-01), Smith et al.
patent: 4160671 (1979-07-01), Stahlhofen
patent: 4189323 (1980-02-01), Buhr
patent: 4458000 (1984-07-01), Stahlhofen
patent: 4696888 (1987-09-01), Buhr
patent: 4708925 (1987-11-01), Newman
patent: 4842990 (1989-06-01), Herrmann et al.
patent: 4927732 (1990-05-01), Merrem et al.
patent: 4927741 (1990-05-01), Garth et al.
patent: 5017462 (1991-05-01), Stahlhofen
patent: 5084372 (1992-01-01), Hsieh et al.
patent: 5091287 (1992-02-01), Dustin
patent: 5100768 (1992-03-01), Niki et al.
patent: 5372907 (1994-12-01), Haley et al.
Corbiere Steven Leo
Haley Neil Frederick
Eastman Kodak Company
Lesmes George F.
Lorenzo Alfred P.
Tucker J. Lanny
Weiner Laura
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