Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1991-06-04
1993-08-24
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430192, 430193, G03F 7023, G03C 161
Patent
active
052387747
ABSTRACT:
A radiation-sensitive resin composition comprising a solution of an alkali-soluble resin and a radiation-sensitive compound in a solvent comprising a monooxymonocarboxylic acid ester. This composition has a high storage stability (i.e., a very small amount of fine particles are formed during storage) and is suited for use as a resist for making integrated circuits.
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English language translation of French #2,323,170 Published Jan. 1977 (PDI-Tabet et al.).
Harita Yoshiyuki
Hosaka Yoshihiro
Nozue Ikuo
Takatori Masashige
Bowers Jr. Charles L.
Japan Synthetic Rubber Co. Ltd.
Young Christopher G.
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