Radiation-sensitive composition and use thereof in the preparati

Details Radiation-sensitive composition and use thereof in the preparati Radiation-sensitive composition and use thereof in the preparati

1990-02-06

1993-08-31

Niebling, John

Chemistry: electrical and wave energy

Apparatus

Electrolytic

252500, 252518, 252521, G01N 2726

Patent

active

052405869

ABSTRACT:
Radiation-sensitive compositions are disclosed of a type suitable for preparing ion sensitive membranes for electrochemical ion sensors. The compositions are comprised of a radiation-sensitive polymer containing radiation-sensitive recurring units having an ionophore group and recurring units having a crosslinking group. In preparing a membrane the radiation-sensitive composition is coated onto a sensor, exposed to activating radiation to produce crosslinking in areas where the membrane structure is desired, and removed in any remaining non-exposed areas.

REFERENCES:
patent: 4352725 (1982-10-01), Sugano et al.
patent: 4592816 (1986-06-01), Emmons et al.
patent: 4906376 (1990-03-01), Fyles
patent: 4921591 (1990-05-01), Mochizuki et al.
Light-Sensitive Systems, Jaromir Kosar, (1965) pp. 158-163.
Ledwith, A. and Purbrick, M. D., Polymer, vol. 14, (1973, pp. 521-522.
Wagner, H. M. and Purbrick, M. D., The Jorunal of Photographic Science, vol. 29, (1981), pp. 230-235.

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