Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1998-05-06
2000-07-18
Chu, John S.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
4302701, 430905, G03F 7004
Patent
active
060905182
ABSTRACT:
A radiation sensitive composition comprising a film-forming resin and a bis(sulfonyl)diazomethane compound of the following formula (1) or (2): ##STR1## wherein each of R.sup.1 and R.sup.3 is a linear, branched or cyclic alkyl group which may be substituted, R.sup.2 is a halogen atom, an alkoxy group which may be substituted, a nitro group, a cyano group, a nitrile group or an amide group, and each of R.sup.4, R.sup.5 and R.sup.6 which are independent of one another, is a linear, branched or cyclic alkyl group which may be substituted, a halogen atom, an alkoxy group which may be substituted, a nitro group, a cyano group, a nitrile group or an amide group.
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patent: 5558976 (1996-09-01), Urano et al.
patent: 5770343 (1998-06-01), Sato et al.
Fujita Jun
Hino Etsuko
Niinomi Takaaki
Urano Toshiyuki
Yokoo Toshiaki
Chu John S.
Mitsubishi Chemical Corporation
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