Radiation sensitive composition

Details Radiation sensitive composition Radiation sensitive composition

1997-02-26

1999-10-05

Chu, John S.

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

4302701, 430905, 430910, G03F 7004

Patent

active

059621800

ABSTRACT:
A radiation sensitive composition comprising (A) a copolymer comprising recurring units of a p-hydroxystyrene unit and a styrene unit having an acetal group or a ketal group at the p-position, (B) a copolymer comprising recurring units of a t-butyl (meth)acrylate unit and a p-hydroxystyrene unit, and (C) a radiation sensitive acid-generating agent.

REFERENCES:
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patent: 5482816 (1996-01-01), Murata et al.
patent: 5556734 (1996-09-01), Yamachika et al.
patent: 5558976 (1996-09-01), Urano et al.
patent: 5585218 (1996-12-01), Nakano et al.
patent: 5627006 (1997-05-01), Urano et al.
patent: 5670299 (1997-09-01), Urano et al.
patent: 5679495 (1997-10-01), Yamachika et al.

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