Radiation-resistant high molecular composition

Details Radiation-resistant high molecular composition Radiation-resistant high molecular composition

1987-09-21

1990-02-13

Schofer, Joseph L.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Processes of preparing a desired or intentional composition...

524370, 524369, 428379, 428389, 428390, G21F 102

Patent

active

049007661

ABSTRACT:
A radiation-resistant high molecular composition is disclosed, characterized in that, to the high molecular polymer, a halogenated acenaphtylene and/or condensates thereof represented by a following general formula [I] ##STR1## (wherein, X indicates a chlorine or bromine atom, a indicates 0 to 2, b indicates 1 to 6 and n indicates an integer not less than 1) and a diphenyl ether derivative represented by a following general formula [II] ##STR2## (wherein, R.sub.1 and R.sub.2 indicate any ones of hydrogen atom, alkyl, alkoxy, phenyl phenoxy, diphenyloxy and terphenyloxy group) and/or basic lead compound are formulated.

REFERENCES:
patent: 4554173 (1985-11-01), Fujimura et al.

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