Radiation-polymerizable composition and process for the applicat

Details Radiation-polymerizable composition and process for the applicat Radiation-polymerizable composition and process for the applicat

1986-06-17

1987-09-22

Kittle, John E.

Radiation imagery chemistry: process, composition, or product th

Stripping process or element

430312, 430327, 430330, 430394, 430319, 430292, G03C 500, G03C 1112

Patent

active

046955275

ABSTRACT:
A photopolymerizable composition is disclosed which comprises: (a) a free-radically polymerizable compound, (b) a polymeric binder, (c) a photopolymerization initiator, (d) a compound which is thermally crosslinkable with the polymeric binder, with a polymerization product of (a) or with itself, and (e) a pigment. The disclosed composition is used for applying markings to printed circuits and preferably is applied to the solder-resist layer using a dry-resist process, is exposed and then developed, either separately or together with the solder-resist layer.

REFERENCES:
patent: 3956043 (1976-05-01), Zahir et al.
patent: 4054479 (1977-10-01), Peiffer
patent: 4157407 (1979-06-01), Peiffer
patent: 4425209 (1984-01-01), Saeki et al.
patent: 4438189 (1984-03-01), Geissler et al.
patent: 4485304 (1984-11-01), Herwig et al.
patent: 4587199 (1986-05-01), Bennett

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