Radiation mask for producing structural configurations in photo-

Details Radiation mask for producing structural configurations in photo- Radiation mask for producing structural configurations in photo-

1979-05-25

1981-05-19

Cannon, James C.

Stock material or miscellaneous articles

Structurally defined web or sheet

Including aperture

428210, 428337, 428428, 428434, 428435, 428448, 428450, B32B 324, B32B 702, B32B 1710, B32B 3300

Patent

active

042685630

ABSTRACT:
A radiation mask having a masking structure and a carrier therefore, for the production of structural configurations in photosensitive resists by x-ray radiation, with the carrier having registration marks thereon, in which the carrier comprises a layer of approximately 3 to 10 .mu.m in thickness, which layer is formed of material penetratable both by x-rays and by radiation in the visible part of the spectrum, the carrier material preferably being polyimide resin or silicon dioxide produced thermally or by a sputtering technique. In a further embodiment the carrier may comprise a first layer of silicon dioxide and a second supporting layer of polyimide resin.

REFERENCES:
Spears et al., Solid State Technology, Jul. 1972, pp. 21-26.

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