Radiation induced pattern deposition

Details Radiation induced pattern deposition Radiation induced pattern deposition

1988-03-01

1990-01-23

Silverman, Stanley

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

156234, 427 531, 427 96, 427 97, 427 99, B05D 306

Patent

active

048957356

ABSTRACT:
A system and method for forming a pattern, such as a layer of metallization, on a surface. A layer comprising patterning material is positioned next to a deposition surface and a portion of the layer is heated to deposit some of the patterning material on the surface. The invention provides a means for transferring a pattern under atmospheric temperature and pressure conditions.

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patent: 4612085 (1986-09-01), Jelks et al.
patent: 4752455 (1988-06-01), Mayer
Mayer et al., "Plasma Production by Laser Driven Explosively Heated Thin Metal Films," J. App. Phys. 57, 2/1985 pp. 827-829.
Roshon Jr., et al., IBM Tech. Disc. Bull., vol. 7, No. 3 Aug. 1964.
Higashi et al., "Spatial Resolution Limits On Projection Patterned Photodeposited Conducting Aluminum Films", Extended Abstracts Beam-Induced Chemical Processes, pp. 55-57, Proceedings of Symposium D 1985 Fall Meeting of the Materials Research Society.
Baum et al., "Projection Printing Of Gold Micropatterns By Photochemical Decomposition", Appl. Phys. Lett. 49(18), 3 Nov. 1986, pp. 1213-1215.
Jain, Kanti, "Laser Application In Semiconductor Microlithography", Microcircuit Engineering 83, ed. by Ahmed et al., Academic Press 1983, pp. 182-190.

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