Radiation induced deposition of metal on semiconductor surfaces

Details Radiation induced deposition of metal on semiconductor surfaces Radiation induced deposition of metal on semiconductor surfaces

1981-05-01

1982-11-16

Newsome, John H.

Coating processes

Electrical product produced

Welding electrode

427 88, 427 92, B05D 118, B05D 306

Patent

active

043594859

ABSTRACT:
A metal layer is formed on a surface of a Group III-V compound semiconductor by placing the surface in contact with a metal-containing solution and directing laser radiation through the solution. The radiation has a wavelength which is absorbed in the surface, thereby thermally inducing a chemical reaction between the surface and the solution and causing metal from the solution to be deposited on the surface. Specific examples of the deposition of Pt, Au and Zn on InP and GaAs are described.

REFERENCES:
patent: 2723919 (1955-11-01), Pohnan
patent: 4009297 (1977-02-01), Redmond et al.
patent: 4239789 (1980-12-01), Blum et al.
patent: 4264421 (1981-04-01), Bard et al.
patent: 4273594 (1981-06-01), Heller et al.
patent: 4297393 (1981-10-01), Denning et al.
patent: 4321283 (1982-03-01), Patel et al.
Ehrlich et al. "IEEE, Journal of Quantum Electronics" vol. QE-16, No. 11 (1980) pp. 1233-1242.
Cullis et al. "J. Phys. E: Sci. Instrum." vol. 12, pp. 688-689 (1979).
Deutsch et al. Applied Phys. Letters, vol. 36, #10, pp. 847-848, 5-1980.
Deutsch et al. Applied Phys. Letters, vol. 35, #2, pp. 175-176, 7-1979.
Ehrlich et al. Applied Phys. Letters, vol. 36, #11, pp. 916-918, 6-1980.

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