Radiation heated reactor process for chemical vapor deposition o

Details Radiation heated reactor process for chemical vapor deposition o Radiation heated reactor process for chemical vapor deposition o

1980-10-28

1983-08-30

Childs, S. L.

Coating processes

Electrical product produced

Integrated circuit, printed circuit, or circuit board

427 50, 427 51, 427 55, 4272481, 4272555, 427255, B05D 302, B05D 314

Patent

active

044016891

ABSTRACT:
A method of chemically vapor depositing a material on a plurality of stacked substrates comprising heating a tubular susceptor surrounding the stack to thereby heat the substrates by radiant heating.

REFERENCES:
patent: 2936246 (1960-05-01), Coghill
patent: 3226254 (1965-12-01), Reuschel
patent: 3460510 (1969-08-01), Currin
patent: 3645230 (1972-02-01), Hugle et al.
patent: 3922467 (1975-11-01), Pinchon
patent: 3934060 (1976-01-01), Burt et al.
patent: 4062318 (1977-12-01), Ban et al.
patent: 4082865 (1978-04-01), Ban et al.
patent: 4096822 (1978-06-01), Yamawaki et al.
patent: 4098223 (1978-07-01), Ertl et al.
patent: 4108106 (1978-08-01), Dozier

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