Radiation emitting semiconductor diode of buried hetero type hav

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction

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257 96, 257101, 257103, H01L 3300

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active

059144963

ABSTRACT:
A radiation-emitting semiconductor diode of a buried hetero type having an active layer situated between two InP cladding layers with a confinement layer of limited Al content disposed between the active layer and one or both of the InP cladding layers. The active region has an emission wavelength above 1 .mu.m and forms part, together with the separate confinement layer and the InP cladding layers, of a strip-shaped region which is surrounded by a current-blocking third cladding layer of InP. The separate confinement layer(s) of the inventive diode includes a semiconductor material with a most 30% aluminum, and preferably at most 20% aluminum, or an aluminum-free semiconductor material. The diode has reduced starting current increases over time so as to increase the life of the diode. A method of manufacturing such a diode is also provided.

REFERENCES:
"Novel Etching Technique for a Buried Heterostructure GalnAs/AlGalnAs Quantum-Well Laser Diode", by A. Kasukawa et al, Appl. Phys. Lett. 59 (11), Sep. 9, 1991, pp. 1269-1271.
"Very Low Threshold Current OmCVC Grown 1.5.mu.m GalnAs/AlGalnAs Buried Heterostructure Quantum Well Laser Diode Using A Novel Etching Technique", by A. Kasukawa et al, LEOS 91, Proc. pp. 60-61, 1991.

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