Radiation curable low stress relaxation elastomeric materials

Details Radiation curable low stress relaxation elastomeric materials Radiation curable low stress relaxation elastomeric materials

2003-07-01

2008-11-04

Watkins, III, William P (Department: 1794)

Stock material or miscellaneous articles

Structurally defined web or sheet

Including aperture

C428S132000, C428S131000, C264S477000, C002S456000, C522S006000, C522S035000

Reexamination Certificate

active

07445831

ABSTRACT:
A radiation-curable low stress relaxation elastomeric material with improved elastic and mechanical properties. The elastomeric material may be used alone or with skin layers to form elastomeric films, webs, laminates and products containing them.

REFERENCES:
patent: 3860003 (1975-01-01), Buell
patent: 3929135 (1975-12-01), Thompson
patent: 4133731 (1979-01-01), Hansen et al.
patent: 4152387 (1979-05-01), Cloeren
patent: 4154240 (1979-05-01), Ikuno et al.
patent: 4163664 (1979-08-01), Ugo
patent: 4197069 (1980-04-01), Cloeren
patent: 4342314 (1982-08-01), Radel et al.
patent: 4381781 (1983-05-01), Sciaraffa et al.
patent: 4533308 (1985-08-01), Cloeren
patent: 4552709 (1985-11-01), Koger, II et al.
patent: 4556464 (1985-12-01), St. Clair
patent: 4695422 (1987-09-01), Curro et al.
patent: 4716183 (1987-12-01), Gamarra et al.
patent: 4741877 (1988-05-01), Mullane, Jr.
patent: 4857067 (1989-08-01), Wood et al.
patent: 4878825 (1989-11-01), Mullane, Jr.
patent: 4938753 (1990-07-01), Van Gompel et al.
patent: 5073611 (1991-12-01), Rehmer et al.
patent: 5143679 (1992-09-01), Weber et al.
patent: 5151092 (1992-09-01), Buell et al.
patent: 5156793 (1992-10-01), Buell et al.
patent: 5167897 (1992-12-01), Weber et al.
patent: 5221274 (1993-06-01), Buell et al.
patent: 5246433 (1993-09-01), Hasse et al.
patent: 5407717 (1995-04-01), Lucast et al.
patent: 5407971 (1995-04-01), Everaerts et al.
patent: 5459174 (1995-10-01), Merrill et al.
patent: 5464401 (1995-11-01), Hasse et al.
patent: 5468821 (1995-11-01), Lucast et al.
patent: 5518801 (1996-05-01), Chappell et al.
patent: 5554145 (1996-09-01), Roe et al.
patent: 5569234 (1996-10-01), Buell et al.
patent: 5580411 (1996-12-01), Nease et al.
patent: 5628097 (1997-05-01), Benson et al.
patent: 5650214 (1997-07-01), Anderson et al.
patent: 5669897 (1997-09-01), Lavon et al.
patent: 5733628 (1998-03-01), Pelkie
patent: 5897545 (1999-04-01), Kline et al.
patent: 6004306 (1999-12-01), Robles et al.
patent: 6120487 (2000-09-01), Ashton
patent: 6294698 (2001-09-01), Nohr et al.
patent: 6303208 (2001-10-01), Pelkie
patent: 6369123 (2002-04-01), Stark et al.
patent: 6384139 (2002-05-01), Ho et al.
patent: 6586354 (2003-07-01), Topolkaraev et al.
patent: 2003/0105232 (2003-06-01), Zhao et al.
patent: WO 93/16131 (1993-08-01), None
patent: WO 98/37266 (1998-08-01), None
patent: WO 99/64931 (1999-12-01), None
patent: WO 01/19918 (2001-03-01), None
patent: WO 01/19920 (2001-03-01), None
patent: WO 02/20625 (2002-03-01), None

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