Radiation converting substrate, radiation image pickup...

Radiant energy – Invisible radiant energy responsive electric signalling – Semiconductor system

Reexamination Certificate

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C250S483100, C250S484300, C250S472100

Reexamination Certificate

active

07026624

ABSTRACT:
The invention is to prevent an interlayer cleavage between a phosphor layer and a moisture-preventing protective layer. In a radiation converting substrate constituted by forming at least a phosphor layer12composed of an alkali halide for converting a radiation into light and a light emission activator, and a moisture-preventing protective layer in succession on a radiation-transmitting substrate11, the moisture-preventing protective layer is constituted of a first plasma polymerization film13formed from a monomer of a silane compound, and a second plasma polymerization film14formed from a monomer of a fluorine-containing unsaturated hydrocarbon. A radiation image pickup apparatus is formed by adhering such radiation converting substrate and a sensor substrate having a photoelectric converting element.

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patent: 2000-356679 (2000-12-01), None
patent: WO 98/36290 (1998-08-01), None
patent: WO 00/63722 (2000-10-01), None
Kato, New Fluorine-Containing Monomer, Sep. 26, 2000, http://www.pcimag.com/CDA/ArticleInformation/features/BNP—Features—Item/0,1846,11368,00.html.

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