Radiation concentrating system

Details Radiation concentrating system Radiation concentrating system

1977-06-30

1979-04-17

Evans, F. L.

Optics: image projectors

Plural projection paths with single light source

353 3, G05D 2500

Patent

active

041497775

ABSTRACT:
A radiation concentration system for reflecting incident radiation rays from a displaceable source to a fixedly positioned focus. The concentration system includes a positioning mechanism for maintaining a mirror element plane normal to a bisecting line of an incident and a reflected angle of radiation impinging on and being reflected from the mirror plane. The radiation concentrating system provides for a displacement mechanism which drives the mirror element about mutually perpendicular axis lines. The displacement mechanism drives the mirror element about a first axis line extending in a direction from the displacement mechanism to the focus and further drives the mirror element about a second axis line normal to the first axis line. In this manner, the mirror element is maintained in a predetermined positional relation for reflection of the incident radiation to the fixed focus.

REFERENCES:
patent: 1976428 (1934-10-01), Arthuys et al.
patent: 3466119 (1969-09-01), Francia
patent: 4034735 (1977-07-01), Waldrip

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