Radiant polishing block heater

Details Radiant polishing block heater Radiant polishing block heater

1997-10-15

1999-05-25

Rose, Robert A.

Abrading

Abrading process

Glass or stone abrading

451460, 451 7, 451285, B24B 100

Patent

active

059065338

ABSTRACT:
A method for mounting a semiconductor wafer on a polishing block to hold the semiconductor wafer during polishing. The method comprises the steps of providing a polishing block having a surface for mounting the semiconductor wafer, coating the polishing block surface with a bonding agent, applying radiant heat to the polishing block and bonding agent to soften the bonding agent, and applying the semiconductor wafer to the softened bonding agent. The step of applying radiant heat to the polishing block and bonding agent is performed by a radiant heater in a dry environment.

REFERENCES:
patent: 4450652 (1984-05-01), Walsh
patent: 5127196 (1992-07-01), Morimoto et al.
patent: 5597442 (1997-01-01), Chen et al.
patent: 5605487 (1997-02-01), Hileman et al.

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