Brushing – scrubbing – and general cleaning – Implements – Brush or broom
Reexamination Certificate
2011-08-09
2011-08-09
Nguyen, Dung Van (Department: 3723)
Brushing, scrubbing, and general cleaning
Implements
Brush or broom
C015S022100
Reexamination Certificate
active
07992246
ABSTRACT:
In a 360-degree toothbrush in which a brush head is formed by superposing disk-shaped radial vanes1in an axial direction, the arranging pitch of the radial vanes1is increased so as to make the bristle density appropriate. Spacers are not used between the radial vanes1so as to increase the productivity, and to improve the hygiene condition. In order to realize these aspects, an annular protrusion or protrusions3are formed on one or both of the surfaces of an annular weld portion2of the radial vane1. The annular protrusion3is formed at the same time when forming the weld portion2in a welding step in which the bristle bundle is opened radially and the center part is welded so that the radial vane1is manufactured.
REFERENCES:
patent: 3258802 (1966-07-01), Rodriguez
patent: 5035020 (1991-07-01), Winiewski
patent: 6325626 (2001-12-01), Blass
patent: 6471300 (2002-10-01), Tomiyama
patent: 6477729 (2002-11-01), Ben-Ari
patent: 10-337295 (1998-12-01), None
patent: 2003-88424 (2003-03-01), None
patent: 2003-219911 (2003-08-01), None
patent: 2003-319834 (2003-11-01), None
patent: 3646118 (2005-05-01), None
patent: 02/07563 (2002-01-01), None
Higuchi Izumi
Takeuchi Toshifumi
Ueba Yasushi
Higuchi Manufactory Co., Ltd.
Nguyen Dung Van
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Tiger Kasei S.A.
LandOfFree
Radial vane for tooth brush, tooth brush using the same, and... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Radial vane for tooth brush, tooth brush using the same, and..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Radial vane for tooth brush, tooth brush using the same, and... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2745859