Radial flow reactor including glow discharge limitting shield

Details Radial flow reactor including glow discharge limitting shield Radial flow reactor including glow discharge limitting shield

1978-09-28

1980-04-01

Kendall, Ralph

Coating apparatus

Gas or vapor deposition

With treating means

313210, 156643, C23C 1308

Patent

active

RE0302449

ABSTRACT:
An improved radio frequency (rf) powered radial flow cylindrical reactor utilizes a gas shield which substantially limits the glow plasma discharge reaction to a section of the reactor over the semiconductor substrates which are to be coated. The gas shield permits the use of higher rf input power which contributes to the formation of protective films that have desirable physical and electrical characteristics.

REFERENCES:
patent: 1560103 (1925-11-01), Schmier
patent: 3675066 (1972-07-01), Armstrong et al.
patent: 3757733 (1973-09-01), Reinberg

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