Photography – Fluid-treating apparatus – Having photographic medium feed
Patent
1997-07-28
1999-01-26
Rutledge, D.
Photography
Fluid-treating apparatus
Having photographic medium feed
396617, 396620, 396626, 396627, G03D 302, G03D 308
Patent
active
058647279
ABSTRACT:
A rack which can completely expel air remaining in treating solution passages. The rack has a rack body formed with a downward feed path and an upward feed path. A rack plate is provided on the outer side of each feed path. Each plate has treating solution passages extending in a width direction of the plate, and nozzles for blowing treating solution fed into the treating solution passages into the feed paths. An air reservoir is formed in the longitudinal central portion of each treating solution passage. An air vent passage is connected to the top of each air reservoir. If there is any air remaining in the treating solution passages when the rack body is set, such air can be urged into the air reservoirs by treating solution flowing into the treating solution passages and expelled from the air vent passages.
Omori Hisashi
Tanaka Tomoya
Noritsu Koki Co., Ltd.
Rutledge D.
LandOfFree
Rack for feeding photosensitive material does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Rack for feeding photosensitive material, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Rack for feeding photosensitive material will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1457542