Quinophthalone-derivative based crystallization modifiers

Compositions: coating or plastic – Materials or ingredients – Pigment – filler – or aggregate compositions – e.g. – stone,...

Reexamination Certificate

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C106S031760, C106S413000, C106S493000, C106S494000, C106S495000, C106S496000, C106S497000, C008S657000, C347S100000, C430S007000, C430S108200, C524S083000, C524S086000, C524S087000, C524S095000, C544S363000, C546S154000, C546S171000, C546S173000

Reexamination Certificate

active

06849116

ABSTRACT:
Quinophthalone derivatives have the general formula IwhereR1, R2, R3and R5are independently hydrogen, halogen or C1-C4-alkyl;R4is —SO3H, —SO3+N+R6R7R8R9, —SO2NR6R7, —CH2NR6R7, —CH2R10, —COOH, —COO−N+R6R7R8R9, —COOR11, —COR11, —NO2or C1-C4-alkyl;R6, R7, R8and R9are independently hydrogen; C1-C22-alkyl or C2-C22-alkenyl whose carbon chains may be interrupted by one or more moieties selected from the group consisting of —O—, —S—, —NR12—, —CO— and —SO2— and/or which may each be mono- or polysubstituted by hydroxyl, halogen, aryl, C1-C4-alkoxy and/or acetyl; C3-C8-cycloalkyl whose carbon skeleton may be interrupted by one or more moieties selected from the group consisting of —O—, —S—, —NR12— and —CO— and/or which may be mono- or polysubstituted by hydroxyl, halogen, aryl, C1-C4-alkoxy and/or acetyl; dehydroabietyl or aryl; R6and R7or R6, R7and R8are together a 5- to 7-membered cyclic radical which includes the nitrogen atom and may include further heteroatoms;R10isR11is alkyl R6;R12is hydrogen or C1-C4-alkyl;X1, X2and X3: are independently arylene, which may be substituted by halogen, arylsulfonyl or —COR13or —CO—C6H4—CO—;R13is C1-C3-alkyl or phenyl.

REFERENCES:
patent: 4067870 (1978-01-01), Shimada et al.
patent: 4077960 (1978-03-01), Shimada et al.
patent: 4150025 (1979-04-01), Shimada et al.
patent: 17 70 960 (1972-01-01), None
patent: 26 26 271 (1976-12-01), None
patent: 26 38 528 (1977-03-01), None
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patent: 0 335 237 (1989-10-01), None
patent: 001138723 (2001-10-01), None
patent: 1486022 (1977-09-01), None
patent: 2008142 (1977-10-01), None
patent: 53-50231 (1978-05-01), None
patent: 53-52537 (1978-05-01), None
patent: 97 46623 (1997-12-01), None
patent: 98 32802 (1998-07-01), None
patent: 01 27206 (2001-04-01), None
Chemical Abstract No. 90:105638, abstract of Japanese Patent Specification No. 53-121822 (Oct. 1978).

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