Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1995-12-21
1998-12-29
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430169, 430191, 430192, 430193, G03F 7023, G03C 161
Patent
active
058539476
ABSTRACT:
A photosensitive positive working photosensitive composition suitable for use as a photoresist, which comprises an admixture of at least one water insoluble, aqueous alkali soluble, film forming novolak resin; at least one o-diazonaphthoquinone photosensitizer; and a photoresist solvent mixture comprising a propylene glycol alkyl ether acetate and 3-methyl-3-methoxy butanol and process for producing such a composition.
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Chemistry & Application of Phenolic Resins, Chapter 4.
JP 4009064 Sumitomo Chemical Jan. 1992--Abstract.
JP 4009852 Sumitomo Chemical Jan. 1992--Abstract.
Aubin Daniel P.
Dixit Sunit S.
Khanna Dinesh N.
Rahman M. Dalil
Wanat Stanley F.
Clariant Finance (BVI) Limited
Young Christopher G.
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