Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1991-01-23
1992-07-07
Schilling, Richard L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430165, 430166, 430190, 430192, 430193, G03F 7023, G03C 161
Patent
active
051282305
ABSTRACT:
This invention is directed to novel photoresist processes and compositions having high resolution novalac resins, high resolution photoactive components with several diazoquinone groups per molecule, and solvents having a high solvency power, better safety, improved photospeed, higher contrast and equivalent cast film thickness from lower percent solids formulations.
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Daniels Brian K.
Madoux David C.
Templeton Michael K.
Trefonas, III Peter
Woodbrey James C.
Corless Peter F.
Goldberg Robert L.
Schilling Richard L.
Shipley Company Inc.
Young Christopher G.
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