Quick-drying nail coating method and composition

Details Quick-drying nail coating method and composition Quick-drying nail coating method and composition

1992-10-22

1995-10-10

Webman, Edward J.

Drug, bio-affecting and body treating compositions

Manicure or pedicure compositions

427508, 524 35, 524560, 522 44, 522 72, 522 89, A61K 7043, C09D10108, C09D13310, C08L 118

Patent

active

054569052

ABSTRACT:
A photo-reactive nail polish coating composition that cures quickly upon exposure to natural light. The coating consists of a polymer formed from a composition comprising nitrocellulose, a photo-reactive monomer, a photoinitiator and a reaction inhibitor, resulting in a product compatible with commercially available nail polish of any color and removable by standard acetone-based polish removers. It is also compatible with every-day chores because it is insoluble in water. The composition is not phototoxic and has very low potential for skin irritation or sensitization. The photo-reactive coating is applied over the wet nail polish and then exposed to light, causing the nail polish to dry in a few minutes.

REFERENCES:
patent: 2262274 (1941-11-01), Fingerlin
patent: 2374472 (1945-04-01), Corbett
patent: 3749592 (1973-07-01), Gaske et al.
patent: 3844790 (1974-10-01), Chang et al.
patent: 3896014 (1975-07-01), Rosenberg
patent: 3928113 (1975-12-01), Rosenberg
patent: 4066582 (1978-01-01), Babian et al.
patent: 4126675 (1978-11-01), Boulogne et al.
patent: 4596260 (1986-06-01), Giuliano
patent: 4855212 (1989-08-01), Targ et al.
patent: 5118495 (1992-06-01), Nafziger et al.

Affiliated with

Also associated with

Rating

Quick-drying nail coating method and composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Quick-drying nail coating method and composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Quick-drying nail coating method and composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2309057