Drying and gas or vapor contact with solids – Apparatus – Houses – kilns – and containers
Patent
1993-04-13
1995-08-29
Bennet, Henry A.
Drying and gas or vapor contact with solids
Apparatus
Houses, kilns, and containers
34218, 34239, 34487, F26B 1300
Patent
active
054449235
ABSTRACT:
The invention is directed to a manifold 10 that is used in conjunction with a die attach cure station for providing a "quick cure" of the die mount adhesive, and for forcing contaminants away from the semiconductor die 33 surface. The manifold has an air put port 21 directly above the semiconductor die. Forced air is directed through the port. At each side of the forced port are vacuum ports 20,22 through which a vacuum is applied to draw air and heated die attach contaminants from the die surface. Air is also drawn from below and around the die mounting area to provide a stream of air that is drawn into the vacuum ports.
REFERENCES:
patent: 5177878 (1993-01-01), Visser
Head Michael R.
Nye Larry W.
Romm Douglas W.
Bennet Henry A.
Courtney Mark E.
Donaldson Richard L.
Holland Robby T.
Texas Instruments Incorporated
LandOfFree
Quick cure exhaust manifold does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Quick cure exhaust manifold, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Quick cure exhaust manifold will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1811985