Quick change sputter target assembly

Details Quick change sputter target assembly Quick change sputter target assembly

1991-05-20

1992-09-15

Nguyen, Nam

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20429818, C23C 1434

Patent

active

051475219

ABSTRACT:
A sputtering target assembly is disclosed having a sputtering gun with an inner and outer annular wall, where the inner annular wall has a plurality of radially projecting set screws, threadably movable within threaded apertures in the inner annular wall. A mounting ring is profiled to fit over the inner annular wall, the mounting ring having a recessed grove, into which the set screws are received, to secure the mounting ring. The mounting ring includes a plurality of radially disposed spring plungers which are threadably installed in threaded apertures in the mounting ring. The target has a grooved inner annular surface for receiving the spring ball plungers, whereby the target is retained to the sputtering gun.

REFERENCES:
patent: 4100055 (1978-07-01), Rainey
patent: 4385979 (1983-05-01), Pierce et al.
patent: 4457825 (1984-07-01), Lamont, Jr.
patent: 4657654 (1987-04-01), Mintz
patent: 4820397 (1989-04-01), Fielder et al.

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