Quick-change precursor manifold for large-area CVD and PECVD

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With gas inlet structure

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C118S7230ER

Reexamination Certificate

active

07922864

ABSTRACT:
A tube-array showerhead for CVD or PECVD on large substrates delivers precursors to a process chamber via an array of tubes drilled with precision holes. The tubes rapidly become contaminated with use and must be changed frequently to maintain process quality. An improved manifold for a tube-array showerhead, intended for processes with a low pressure differential between the tubes and process chamber, includes holding-stubs to hold each tube by its ends outside the manifold block. At least one holding-stub for each tube is spring-loaded along the direction of the tube's operating axis. Contaminated tubes can be removed, and clean tubes installed, without disassembling the manifolds or disturbing any high-pressure-differential seals to the ambient atmosphere or precursor supplies. This invention reduces production costs by decreasing chamber down-time and reducing the risk of creating leaks when tubes are changed.

REFERENCES:
patent: 3464436 (1969-09-01), Bruning
patent: 6294740 (2001-09-01), Van Swearingen
patent: 7575024 (2009-08-01), Zeiber et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Quick-change precursor manifold for large-area CVD and PECVD does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Quick-change precursor manifold for large-area CVD and PECVD, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Quick-change precursor manifold for large-area CVD and PECVD will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2628093

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.