Quick and accurate modeling of transmitted field

Details Quick and accurate modeling of transmitted field Quick and accurate modeling of transmitted field

2007-11-13

2007-11-13

Rosasco, S. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

10789703

ABSTRACT:
Systems and techniques to quickly and accurately model a transmitted electromagnetic field through a mask, to design a mask, and to create a library of corrections including edge corrections, edge-to-edge corrections, and corner corrections.

REFERENCES:
patent: 6794096 (2004-09-01), Kroyan
patent: 2003/0074646 (2003-04-01), Kotani et al.
“Domain decomposition methods for simulation of printing and inspection of phase defects”; Michael Lam et al.; Department of Electrical Engineering and Computer Sciences, University of CA-Berkeley, Berkeley, CA 94720; mlLam@eecs.berkeley.edu.
“Boundary Layer Model to Account for Thick Mask Effects in PhotoLithography”; Jaione Tirapu-Azpiroz et al.; Electrical Engineering Dept., UCLA, Los Angeles, CA 90095-1594; jaione@ee.ucla.edu.edu.
“Simplified Models for Edge Transitions in Rigorous Mask Modeling”; Konstantinos Adam et al.; EECS Dept., University of CA at Berkeley, Berkeley, CA 94720; kadam@eecs.berkeley.edu.
Fast rigorous three-dimensional mask diffraction simulation using Battle-Lemarie wavelet-based multiresolution time-domain method, M. S. Yeung, Boston Univ. [5040-07] SPIE 2003, vol. 5040, p. 69.
Fast topography simulation using differential method, S. Y. Zinn, S. Kim, S. Choi, J. Sohn, Samsung Electronics Co., Ltd. (South Korea) [5040-09] SPIE 2003, vol. 5040, p. 92.
Rigorous 3D simulation of phase defects in alternating phase-shifting masks. Pistor, T.V.; Proceedings of the SPIE—The International Society for Optical Engineering, vol. 4562, 2002. p. 1038-50. Conference Paper.
Enhancements in rigorous simulation of light diffraction from phase-shift masks. Erdmann, A.; Kachwala, N.; Proceedings of the SPIE—The International Society for Optical Engineering, vol. 4691, 2002. p. 1156-67. Conference Paper.
METROPOLE-3D: an efficient and rigorous 3D photolithography simulator. Strojwas, A.J.; Li, X.; Lucas, K.D.; IEICE Transactions on Electronics, vol. E82-C, No. 6, Jun. 1999. p. 821-9. Journal Paper.
Lithography simulation employing rigorous solutions to Maxwell's equations. Gordon, R.; Mack, C.A.; Proceedings of the SPIE—The International Society for Optical Engineering, vol. 3334, 1998. p. 176-96. Conference Paper.

Affiliated with

Also associated with

Rating

Quick and accurate modeling of transmitted field does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Quick and accurate modeling of transmitted field, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Quick and accurate modeling of transmitted field will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3870432