Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Reexamination Certificate
2006-06-13
2006-06-13
Sample, David (Department: 1755)
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
C423S328100, C423S328200, C420S418000, C420S420000, C501S134000, C501S153000, C501S154000
Reexamination Certificate
active
07060239
ABSTRACT:
The present invention relates to an icosahedral, quasicrystalline compound or compound present in the form of an approximant having the nominal composition: TivCrwAlxSiyOz, in which v=60-65; w=25-30; x=0-6; Y=8-15; z=8-20; and in which the atom percent of oxygen is in the range of between 8 and 15%, and that of aluminum in the range of between 2 to 5%. Due to their layered structure and ceramic intermediate layers, compounds of this type exhibit excellent properties, in particular for use as coatings for gas turbine components, such as for example, rotor blades or guide vanes.
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Kaiser Anton
Kelton Kenneth Franklin
Konter Maxim
Shklover Valery
Alstom Technology Ltd.
Cermak Adam J.
Cermak & Kenealy LLP
Sample David
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