Quartz tank for wet semiconductor wafer processing

Details Quartz tank for wet semiconductor wafer processing Quartz tank for wet semiconductor wafer processing

1997-12-10

1999-03-23

Stinson, Frankie L.

Cleaning and liquid contact with solids

Apparatus

With movable means to cause fluid motion

134902, 134201, 134198, B08B 304

Patent

active

058846441

ABSTRACT:
A quartz tank for wet semiconductor wafer processing includes one or more ports extending through the tank for the exchange of fluids with the tank. The openings may be aligned with a T-shaped quartz stem having an enlarged end retained on the interior side of said quartz tank in sealing abutment therewith. The lower end of the quartz stem may have external threads to abut with a suitable union. The union may include a nut having a reduced diameter lower end to engage an enlarged end of the tubing member connected to the bottom of the quartz stem. An o-ring seal may be sandwiched between the tubing and the lower end of the quartz stem. The nut may be formed of a carbon-fiber reinforced fluorocarbon material such as perfluoroalkoxy.

REFERENCES:
patent: 3983361 (1976-09-01), Wild et al.
patent: 4955402 (1990-09-01), Miranda
patent: 5148823 (1992-09-01), Bran
patent: 5279316 (1994-01-01), Miranda
patent: 5339843 (1994-08-01), Benedict et al.
patent: 5365960 (1994-11-01), Bran
patent: 5732724 (1998-03-01), Becknell

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