Quartz glass, heat treating apparatus using quartz glass, and he

Details Quartz glass, heat treating apparatus using quartz glass, and he Quartz glass, heat treating apparatus using quartz glass, and he

1998-05-28

2000-07-25

Vincent, Sean

Compositions: ceramic

Ceramic compositions

Glass compositions, compositions containing glass other than...

C03C 306

Patent

active

060936665

ABSTRACT:
A quartz glass which would not become a source for the contamination even if it contains metallic impurities. This quartz glass includes a region where a concentration of E' center as measured by means of an electron spin resonance analysis is 3.times.10.sup.19 cm.sup.-3 or more. This quartz glass can be manufactured by a method including the steps of forming an initial quartz glass by melting and quenching a raw material for quartz glass, and implanting therein an ion, which is capable of entering into an SiO.sub.2 network of the initial quartz glass and substantially incapable of externally diffusing, to increase a concentration of E' center in at least part of the initial quartz glass. This quartz glass can be manufactured by a method making use of a quartz glass raw material containing 0.01 to 0.1% by weight of silicon, by a method of irradiating ultraviolet ray to the initial quartz glass, or by a method of giving an abrasion damage to the surface of the initial quartz glass by means of sand blast.

REFERENCES:
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Shelby, J. E., "Radiation effects in hydrogen-impregnated vitreous silica", Journal of Applied Physics, 50(5), pp. 3702-3706, May 1979.

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