Quartz glass component with reflector layer and method for...

Coating processes – Spray coating utilizing flame or plasma heat – Silicon containing coating

Reexamination Certificate

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C427S165000, C427S579000, C428S432000, C428S446000, C428S701000, C428S702000, C428S704000, C428S332000, C428S333000, C428S336000, C359S599000

Reexamination Certificate

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07947335

ABSTRACT:
Methods for producing a quartz glass component with reflector layer are known in which a reflector layer composed of quartz glass acting as a diffuse reflector is produced on at least part of the surface of a substrate body composed of quartz glass. In order, taking this as a departure point, to specify a method which enables cost-effective and reproducible production of uniform SiO2reflector layers on quartz glass components, it is proposed according to the invention that the reflector layer is produced by thermal spraying by means of SiO2particles being fed to an energy carrier, being incipiently melted or melted by means of said energy carrier and being deposited on the substrate body. In the case of a quartz glass component obtained according to the method, the SiO2reflector layer is formed as a layer which is produced by thermal spraying and has an opaque effect and which is distinguished by freedom from cracks and uniformity.

REFERENCES:
patent: 3457102 (1969-07-01), Grekila et al.
patent: 2004/0115352 (2004-06-01), Schultheis et al.
patent: 2006/0038470 (2006-02-01), Maul et al.
patent: 2008/0075949 (2008-03-01), Kirst et al.
patent: 101 22 718 (2001-05-01), None
patent: 10 2004 051 846 (2006-03-01), None
patent: 10 2004 052 312 (2006-03-01), None
patent: 10 2005 016 732 (2006-10-01), None
patent: 60027676 (1985-02-01), None
Espacenet English language abstract for JP 60027676 A published Feb. 12, 1985.
Espacenet English language abstract for DE102005016732 A1 published Oct. 12, 2006.

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