Quantum well infrared photocathode having negative electron affi

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Low workfunction layer for electron emission

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257 11, 257 21, 257189, 257432, 257459, H01L 2906, H01L 2912, H01L 310232

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060547189

ABSTRACT:
An infrared photocathode comprises an infrared radiation absorbing structure based on multiple quantum well (MQW) material on top of an electron conducting contact layer having a negative electron affinity back surface. In the first photocathode, a top contact layer is etched to form a transmissive diffraction grating to aid photon absorption in the MQW material. In the second photocathode, a plurality of spaced apart MQW structures form a diffraction grating which aids photon absorption in the MQW material.

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