Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Junction field effect transistor
Patent
1989-11-13
1996-03-05
Crane, Sara W.
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Junction field effect transistor
257 24, 257194, H02L 2980
Patent
active
054970156
ABSTRACT:
A semiconductor device using interference effects of electron waves passing through a multichannel, wherein the multichannel is formed by a Dirac-delta-doped layer. A method of manufacturing a semiconductor device comprising the steps of: selectively forming a region of a predetermined crystallographic orientation onto a semiconductor substrate; and alternately growing the first semiconductor layer and the second semiconductor layer whose electron affinity is smaller than that of the first semiconductor layer onto the region of the predetermined crystallographic orientation by a vapor-phase growth method so as to have a convex shape in a manner such that an area of an upper layer is smaller. A semiconductor device in which a channel portion comprising a zigzag fine line is provided between a source and a drain.
REFERENCES:
patent: 4550330 (1985-10-01), Fowler
patent: 4733282 (1988-03-01), Chang et al.
patent: 4780748 (1988-10-01), Cunningham et al.
patent: 4882609 (1989-11-01), Schubert et al.
patent: 4942438 (1990-07-01), Miyamoto
patent: 4977435 (1990-12-01), Yoshimura et al.
Funato Kenji
Ishibashi Akira
Mori Yoshifumi
Bowers Courtney A.
Crane Sara W.
Sony Corporation
LandOfFree
Quantum interference transistor does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Quantum interference transistor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Quantum interference transistor will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1414557