Quantum device utilizing the quantum effect

Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction

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257 23, 257 24, 257 25, 257 17, H01L 29161

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active

054442672

ABSTRACT:
A quantum device including a plate-like conductor part having a necking portion made by forming a first mask layer having a first strip portion on a conductor substrate; forming a second mask layer having a second strip portion on the conductor substrate; etching a region of the conductor substrate which is not covered with the first and second mask layers, by using the first and second mask layers as an etching mask, to form a plurality of first recess portions on a surface of the conductor substrate; selectively covering side faces of the plurality of first recess portions, and side faces of the first and second mask layers with a side wall film; selectively removing only the second mask layer; etching another region of the conductor substrate which is not covered with the first mask layer and the side wall film, by using the first mask layer and the side wall film as an etching mask, to form a plurality of second recess portions on the surface of the conductor substrate; selectively removing part of another region of the surface of the conductor substrate which is not covered with the first mask layer and the side wall film; and removing the first mask layer and the side wall film, to form the plate-like conductor part having the necking portion.

REFERENCES:
patent: 4751194 (1988-06-01), Cibert et al.
patent: 4835578 (1989-05-01), Ohtoshi et al.
patent: 4912531 (1990-03-01), Reed et al.
patent: 4959696 (1990-09-01), Frensley et al.
patent: 4989052 (1991-01-01), Okada et al.
patent: 4996570 (1991-02-01), Van Houten et al.
patent: 5032877 (1991-07-01), Bate
patent: 5233205 (1993-08-01), Usagawa et al.
M. Reed et al., "Observation of Discrete Electronic States in a Zero-Dimensional Semiconductor Nanostructure", Physical Review Letters, vol. 60, No. 6, pp. 535-537 (Feb. 1988).
"Electron Wave Interference Device with Vertical Superlattices Working in Large Current Region", Electronic Letters, vol. 25, No. 11, pp. 728-730 (May 1989), Tsubaki et al.
K. Shimizu et al., "Fabrication of MOS Nanostructure by Employing Electron Beam Lithography and Anisotropic Wet Etching of Silicon", Japanese Journal of Applied Physics, vol. 30, No. 3A, pp. L415-L417 (Mar. 1991).
M. A. Foad et al., "Evaluation of sidewall damage in nanostructures etched in CH.sub.4 /H.sub.2 and SiCl.sub.4, by direct TEM observation", (1990), pp. 293-298, Proceedings of the Seventeenth International Symposium on Gallium Arsenide and Related Compounds, Jersey Channel Islands, Sep. 1990.
N. Yokoyama, "Resonant Tunneling Effects and Their Application to Three-Terminal Devices", The Journal of the Institute of Electronics, Information and Communication Engineers, vol. 72, No. 12, pp. 1387-1391 (Dec. 1989).

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