Quantitative analyzing method by a secondary ion mass spectromet

Radiant energy – Ionic separation or analysis – Methods

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

250281, 2502521, H01J 4926

Patent

active

053509196

ABSTRACT:
A quantitative analyzing method by a secondary ion mass spectrometric method comprises the steps of: quantitatively analyzing the target element by the secondary ion mass spectrometric method with respect to a plurality of ion-implanted standard samples, while changing an implantation energy; and correcting a secondary ion intensity which is obtained with respect to the target element in the surface layer of the sample to be analyzed by the secondary ion mass spectrometric method on the basis of the results of the quantitative analyses with respect to the plurality of standard samples. A secondary ion mass spectrometer having such a function is also disclosed.

REFERENCES:
Leta et al., Analytical Chemistry, vol. 52, No. 3, Mar. 1980, pp. 514-519.
Werner, Acta Electronica, 18, 1, 1975, pp. 51-62.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Quantitative analyzing method by a secondary ion mass spectromet does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Quantitative analyzing method by a secondary ion mass spectromet, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Quantitative analyzing method by a secondary ion mass spectromet will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1267099

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.