Quadrupole R.F. sputtering system having an anode/cathode shield

Details Quadrupole R.F. sputtering system having an anode/cathode shield Quadrupole R.F. sputtering system having an anode/cathode shield

1981-07-27

1982-12-07

Demers, Arthur P.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

C23C 1500

Patent

active

043626114

ABSTRACT:
A quadrupole sputtering system having four electrodes comprised of a cathode, an anode, a cathode/anode shield and an electrically floating target shield circumscribing the source target of the cathode.

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Logan IBM J. Res. Develop. Mar., 1970, pp. 172-175.

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