Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Reexamination Certificate
2008-04-01
2008-04-01
Langel, Wayne A. (Department: 1793)
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
C106S287340, C423S335000, C502S240000
Reexamination Certificate
active
11085151
ABSTRACT:
Pyrogenically produced silicon dioxide powder in the form of aggregates of primary particles having a BET surface area of 300±25 m2/g, wherein the aggregates display an average surface area of 4800 to 6000 nm2, an average equivalent circle diameter (ECD) of 60 to 80 nm and an average circumference of 580 to 750 nm.It is produced by a pyrogenic process in which silicon tetrachloride and a maximum of up to 40 wt. % of a second silicon component comprising H3SiCl, H2SiCl2, HSiCl3, CH3SiCl3, (CH3)2SiCl2, (CH3)3SiCl and/or (n-C3H7)SiCl3are mixed with primary air and a combustion gas and burnt into a reaction chamber, secondary air also being introduced into the reaction chamber, and the feed materials being chosen such that an adiabatic flame temperature of 1390 to 1450° C. is obtained.It can be used as a filler.
REFERENCES:
patent: 4067954 (1978-01-01), Volling
patent: 5340560 (1994-08-01), Rohr et al.
patent: 5855860 (1999-01-01), Nishimine et al.
patent: 6328944 (2001-12-01), Mangold et al.
patent: 6551567 (2003-04-01), Konya et al.
patent: 6800413 (2004-10-01), Barthel et al.
patent: 2001/0033818 (2001-10-01), Nozawa et al.
patent: 2002/0102199 (2002-08-01), Nishimine et al.
patent: 2004/0253164 (2004-12-01), Mangold et al.
patent: 2005/0129603 (2005-06-01), Szillat et al.
U.S. Appl. No. 11/055,605, filed Feb. 11, 2005, Schumacher et al.
U.S. Appl. No. 10/524,037, filed Feb. 9, 2005, Schumacher et al.
U.S. Appl. No. 11/085,151, filed Mar. 22, 2005, Schumacher et al.
U.S. Appl. No. 10/863,348, filed Jun. 9, 2004, Mangold et al.
U.S. Appl. No. 11/084,022, filed Mar. 21, 2005, Schumacher et al.
U.S. Appl. No. 11/084,170, filed Mar. 21, 2005, Schumacher et al.
U.S. Appl. No. 11/085,151, filed Mar. 22, 2005, Schumacher et al.
U.S. Appl. No. 10/530,284, filed Apr. 5, 2005, Moerters et al.
U.S. Appl. No. 10/530,491, filed Apr. 6, 2005, Moerters et al.
U.S. Appl. No. 10/549,929, filed Sep. 20, 2005, Schumacher et al.
Brandl Paul
Ishibashi Naruyasu
Kobayashi Hitoshi
Schumacher Kai
Degussa - AG
Langel Wayne A.
Oblon & Spivak, McClelland, Maier & Neustadt P.C.
LandOfFree
Pyrogenically produced silicon dioxide powder does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Pyrogenically produced silicon dioxide powder, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pyrogenically produced silicon dioxide powder will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3950708