Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Reexamination Certificate
2011-01-18
2011-01-18
Vanoy, Timothy C (Department: 1793)
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
C423S336000, C430S108700, C524S492000, C524S493000, C524S494000, C501S039000, C106S482000, C106S491000
Reexamination Certificate
active
07871589
ABSTRACT:
Provided is a pyrogenically prepared SiO2powder in the form of aggregated primary particles having a statistical thickness surface area (STSA) of 10-500 m2/g, a thickening action based on the STSA of 4-8 mPas·g/m2, and a micropore volume of 0.03-0.07 cm3/g, and a process for preparing the pyrogenic SiO2powder, which involves: introducing hydrolyzable silicon compounds, a primary gas comprising oxygen, and a primary combustion gas into a mixing chamber to produce a mixture; igniting the mixture in a burner to produce a flame, which is burned into a reaction chamber to produce the pyrogenic SiO2powder and gaseous substances; and separating the pyrogenic SiO2powder from the gaseous substances, wherein a ratio of the amount of primary combustion gas introduced to a stoichiometric amount of primary combustion gas required is referred to as gammaprimaryand has a value of less than 1, and wherein a ratio of the amount of primary gas comprising oxygen introduced to a stoichiometric amount of primary gas comprising oxygen required is referred to as lambdaprimaryand has a value of greater than 1.
REFERENCES:
patent: 6063354 (2000-05-01), Mangold et al.
patent: 2003/0138715 (2003-07-01), Barthel et al.
patent: 197 56 840 (1998-07-01), None
patent: 101 45 162 (2003-04-01), None
patent: 10 2004 063 762 (2006-07-01), None
patent: 10 2005 007 753 (2006-08-01), None
patent: 1 004 545 (2000-05-01), None
patent: WO 2004/054929 (2004-07-01), None
P. Pfeifer, et al., “Fractal BET and FHH Theories of Adsorption: A Comparative Study”, Proc. R. Soc. Lond. A., 423, pp. 169-188, 1989.
Hamm Volker
Hille Andreas
Kneisel Florian Felix
Rochnia Matthias
Evonik Degussa GmbH
Hou Michelle
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Vanoy Timothy C
LandOfFree
Pyrogenically prepared silicon dioxide with a low thickening... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Pyrogenically prepared silicon dioxide with a low thickening..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Pyrogenically prepared silicon dioxide with a low thickening... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2712602