Semiconductor device manufacturing: process – Making passive device – Stacked capacitor
Reexamination Certificate
2006-09-19
2006-09-19
Smith, Matthew (Department: 2823)
Semiconductor device manufacturing: process
Making passive device
Stacked capacitor
C438S253000, C438S254000, C438S397000, C438S695000, C257S296000, C257S306000, C257S532000, C257SE27048
Reexamination Certificate
active
07109090
ABSTRACT:
A capacitor structure which has a generally pyramidal or stepped profile to prevent or reduce dielectric layer breakdown is disclosed. The capacitor structure includes a first conductive layer, at least one dielectric layer having a first area provided on the first conductive layer and a second conductive layer provided on the at least one dielectric layer. The second conductive layer has a second area which is less than the first area of the at least one dielectric layer. A method of fabricating a capacitor structure is also disclosed.
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patent: 6207499 (2001-03-01), Hoshi
patent: 6462370 (2002-10-01), Kuwazawa
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patent: 2003/0127675 (2003-07-01), Fujisawa
patent: 2005/0082586 (2005-04-01), Tu et al.
Huang Kun-Ming
Wann Yeh-Jye
Garcia Joannie Adelle
Smith Matthew
Taiwan Semiconductor Manufacturing Co. Ltd.
Tung & Associates
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