PVD cylindrical target

Details PVD cylindrical target PVD cylindrical target

2011-06-07

2011-06-07

Patterson, Marc A (Department: 1782)

Stock material or miscellaneous articles

Hollow or container type article

Polymer or resin containing

C428S034100, C428S034200, C428S035900, C428S036900

Reexamination Certificate

active

07955673

ABSTRACT:
The present invention provides a PVD cylindrical target comprising an evaporation material covering the outer circumferential surface of a cylindrical substrate, the PVD cylindrical target includes a meshing part having at least either of a protruding shape and a recessed shape formed with rounded angular parts at the interface between the substrate and the evaporation material. According to such a structure, peeling or cracking of the evaporation material by a residual stress caused at the interface between the substrate and the evaporation material by a thermal expansion difference between the both can be suppressed, and sufficient adhesiveness between the both can also be ensured.

REFERENCES:
patent: 5354446 (1994-10-01), Kida et al.
patent: 5593624 (1997-01-01), Lewis
patent: 1 752 556 (2007-02-01), None
patent: 64-17862 (1989-01-01), None
patent: 5-230645 (1993-09-01), None
patent: 07-173622 (1995-07-01), None
patent: 7-173622 (1995-07-01), None
patent: 7-228967 (1995-08-01), None
patent: 8-109472 (1996-04-01), None
patent: 9-195039 (1997-07-01), None
patent: 2000-199055 (2000-07-01), None
Office Action issued Nov. 24, 2010, in Japan Patent Application No. 2006-179874 (with English Language Translation).

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