Purified quartz and process for purifying quartz

Details Purified quartz and process for purifying quartz Purified quartz and process for purifying quartz

1990-10-17

1991-08-06

Chaudhuri, Olik

Chemistry of inorganic compounds

Silicon or compound thereof

Oxygen containing

423335, C01B 3312

Patent

active

050376250

ABSTRACT:
Quartz is purified by removing mineral impurities, particularly alkali metal impurities, from within the quartz crystal lattice structure. According to the disclosed process, quartz crystals are subjected to a pretreatment that removes surface bound impurities and then contacted with gaseous HCl at a temperature of from 800.degree. C. to 1600.degree. C. for a period of time of from a few minutes to several hours, thereby diffusing the mineral impurities to the quartz crystal surface where they form salts with chloride ion, removing the salts, and recovering the purified quartz crystals.

REFERENCES:
patent: 4804422 (1989-02-01), Papanikolav et al.
patent: 4818510 (1989-04-01), Jung

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