Purification process for cyclic formals

Distillation: processes – separatory – Distilling to separate or remove only water – From organic compound

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

203 63, 203 64, 549430, B01D 334, C07D31712

Patent

active

056907931

ABSTRACT:
A purification process for cyclic formals, in which water is efficiently removed from a crude cyclic formal, namely, a mixture of a cyclic formal and water which is difficult to be separated from the mixture, thereby obtaining a cyclic formal of high purity which contains only extremely small amounts of water and impurities.
The purification process for cyclic formals is characterized by the steps of supplying a mixture of a cyclic formal and water into a distillation tower, effecting distillation while supplying a hydrophilic solver (A) having a boiling point from 180.degree. to 250.degree. C. and a purified cyclic formal (X) containing not more than 200 ppm of water into the distillation tower at positions higher than the supply position of the mixture and higher than the supply position of the hydrophilic solvent (A), respectively, and taking out a purified cyclic formal from the top of the tower as a distillate.

REFERENCES:
patent: 2350940 (1944-06-01), Squires
patent: 3857759 (1974-12-01), Fiore et al.
patent: 4007095 (1977-02-01), Wolf et al.
patent: 4229262 (1980-10-01), Reed et al.
patent: 4764626 (1988-08-01), Heuvelsland
CA 118: 126957 Abstract.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Purification process for cyclic formals does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Purification process for cyclic formals, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Purification process for cyclic formals will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2103565

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.