Chemistry of inorganic compounds – Halogen or compound thereof – Sulfur containing
Patent
1989-02-10
1990-08-21
Russel, Jeffrey E.
Chemistry of inorganic compounds
Halogen or compound thereof
Sulfur containing
L01B 1745
Patent
active
049504649
ABSTRACT:
Many impurities of sulfuryl fluroide are removed by selective adsorption on activated alumina and activated carbon. Thionyl fluoride, hydrogen fluoride, hydrogen chloride, and water are removed by treating contaminated sulfuryl fluoride with activated alumina. Sulfur dioxide and 1,2-dichloroethane are removed by treating contaminated sulfuryl fluoride with activated carbon. When sulfuryl fluoride is treated with the two adsorbents in sequence, sulfuryl fluoride of exceptionally high purity is obtained.
REFERENCES:
patent: 3092458 (1963-06-01), Ruh et al.
patent: 3714336 (1973-01-01), Davis et al.
patent: 3789580 (1974-02-01), Allemana et al.
patent: 3996029 (1976-12-01), Gustafson et al.
patent: 4087377 (1978-05-01), Fujioka et al.
patent: 4092403 (1978-03-01), Rectenwald et al.
patent: 4738694 (1988-04-01), Godino et al.
T. Terei et al., AlChE Journal, 19, 387-389 (1973).
C. Jorgensen et al., Environmental Progress, 6, 26-31 (1987).
H. Michele, International Chemical Engineering, 27, 183-196 (1987).
O. A. Hougen et al., Chemical Engineering Progress, 43, 197-208 (1947).
Friese David D.
Fujioka George S.
Tobey Brian G.
Bolam Brian M.
Osborne D. Wendell
Russel Jeffrey E.
The Dow Chemical Company
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