Purification of silane via laser-induced chemistry

Details Purification of silane via laser-induced chemistry Purification of silane via laser-induced chemistry

1977-12-28

1979-03-27

Williams, Howard S.

Chemistry: electrical and wave energy

Processes and products

Processes of treating materials by wave energy

204DIG11, B01J 110

Patent

active

041464494

ABSTRACT:
Impurities such as PH.sub.3, AsH.sub.3, and B.sub.2 H.sub.6 may be removed from SiH.sub.4 by means of selective photolysis with ultraviolet radiation of the appropriate wavelength. An ArF laser operating at 193 nm provides an efficient and effective radiation source for the photolysis.

REFERENCES:
ambartsumyan et al, Sov. J. Quantum Electron, vol. 7 No. 1 (Jan., 1977) pp. 96 & 97.

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