Purification of laser gases

Details Purification of laser gases Purification of laser gases

1991-04-18

1991-12-17

Scott, Jr., Leon

Coherent light generators

Particular active media

Gas

372 34, 62 511, 62 555, H01S 322

Patent

active

050738968

ABSTRACT:
Purification of the gas mixture used in an excimer laser is carried out by cooling such mixture in a cryogenic trap to a temperature that is low enough that the lasting gas or gases (e.g. krypton, xenon, fluorine, hydrogen chloride) and the impurities are all substantially fully condensed. This temperature is nevertheless sufficiently high that the buffer gas (neon or helium or a mixture thereof) remains substantially all in gaseous form. The trap is then isolated from the laser vessel and the condensed gases therein are treated to remove at least the condensed impurities from the system. In a xenon chloride laser the condensed impurities can be effectively separated from the condensed laser gases by heating, i.e. differential distillation. After this has been done, the laser gases are returned to the laser vessel. In those instances in which such separation by differential distillation is not practicable, e.g. a krypton fluoride laser, some or all of the condensed lasing gas or gases is removed from the system together with the condensed impurities. Fresh charges of these lasing gases are then supplied to the laser vessel as required. The procedure is characterized by the fact that the buffer gas is retained and reused indefinitely. The method avoids the expense of having to periodically recharge the laser vessel with an entire fill of fresh buffer and lasing gases.

REFERENCES:
patent: 4601040 (1986-07-01), Andrews et al.
patent: 4629611 (1986-12-01), Fan
patent: 4674092 (1987-06-01), Cannon
patent: 4740982 (1988-04-01), Hakuta et al.
patent: 4977749 (1990-12-01), Sercel
patent: 5001721 (1991-03-01), Ludenig et al.

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