Purification of hydrogen peroxide

Details Purification of hydrogen peroxide Purification of hydrogen peroxide

1992-01-23

1993-06-01

Cintins, Ivars

Liquid purification or separation

Processes

Liquid/liquid solvent or colloidal extraction or diffusing...

210639, 210669, 210687, B01D 6158

Patent

active

052156656

DESCRIPTION:

BRIEF SUMMARY
The present invention relates to processes for the purification of hydrogen peroxide solutions and particularly to the production of solutions in which cationic metal concentrations have been reduced to very low levels.
Aqueous hydrogen peroxide solutions are currently made or have been proposed to be made by a variety of different techniques. These include electrolytic techniques often involving hydrolysis of persulphuric acid or a salt thereof, autoxidation techniques in which a carrier, typically an alkyl-substituted anthraquinone, is subjected cyclically to reduction with hydrogen, oxidation with air and extraction of hydrogen peroxide with water and more recently processes involving the direct oxidation of hydrogen with oxygen in the presence of certain catalysts and under selected conditions.
Many variations of the foregoing manufacturing techniques are known. After the aqueous hydrogen peroxide solutions have been formed, they can be concentrated and purified to some extent by water removal or distillation techniques. Although the hydrogen peroxide manufacturing techniques differ markedly in their operation, they share the common result that the aqueous hydrogen peroxide solution obtained, even after distillation, contains significant amounts of residual impurities, including in particular a number of metal ions.
Although there has always been a desire to obtain aqueous hydrogen peroxide solutions of high purity, a qualitative term, the use of hydrogen peroxide in the semiconductor and allied electronics industries has imposed new and increasingly stringent, quantitative standards on the term in recent years. This is because such industries have demanded since their inception lower levels of residual impurities that could remain in peroxide solutions than were tolerable for other purposes, but also because their purity specifications have become increasingly tight, especially noticeably during the period of 1985 to date. It is convenient to call hydrogen peroxide solutions which meet 1988/9 impurity standards as ultra-pure so as to distinguish them from the state of the art products of former eras, which tolerated much higher impurity levels.
It is recognised that various techniques have already been proposed or used for the purification of hydrogen peroxide solutions and these include distillation and related water-removal techniques. These can be especially useful for the removal of organic impurities, such as compounds employed in autoxidation manufacturing methods, but are of lesser value for removing inorganic ions like metals or acidic anions in that they tend to remain to a greater or lesser extent in the aqueous hydrogen peroxide rather than being carried out in the distillate water.
There have also been a number of processes proposed for purifying hydrogen peroxide solutions in which the particularly aggressive transition metal ions have been replaced by more benign ions such as alkali metals. Although such techniques may produce a product that is acceptable for some purposes, they are not acceptable in the electronics field because acceptable levels of such metals too are strictly limited in their product specifications. Thus, the processes of U.S. Pat. No. 2,027,839 assigned to Du Pont or GB 409 361 in the name of Roessler & Hasslacher Chemical Company are not suitable for the instant purpose by virtue of their introduction of substitute metal ions or counterions that are not removed.
In recent times, a purification technique has been proposed in Japanese Kokai 62-187103 (1987) to Wako Junaku KK in which an impure aqueous hydrogen peroxide solution is that are preferably in hydrogen form. Such a process can be effective, but suffers from relatively indiscriminate exchange of metals, with the result that the resin rapidly becomes loaded with transition metal ions that cause decomposition of hydrogen peroxide. This type of reaction is not only highly exothermic but also temperature dependent, so that there is a very real risk that once a decomposition begins, it will rapidly accelerate out

REFERENCES:
patent: 3387938 (1968-06-01), Leaver
patent: 3944485 (1976-03-01), Rembaum et al.
patent: 4132762 (1979-01-01), Kim
patent: 4879043 (1989-11-01), Boughton et al.

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