Purification of hydrofluoric acid etching solutions with weak an

Details Purification of hydrofluoric acid etching solutions with weak an Purification of hydrofluoric acid etching solutions with weak an

1976-12-22

1978-11-14

Vertiz, O. R.

Chemistry of inorganic compounds

Halogen or compound thereof

Hydrogen halide

210 37R, 156642, C01B 722

Patent

active

041255941

ABSTRACT:
A method for purifying a spent hydrofluoric acid etching solution containing siliceous by-products which comprises treating the solution with a weak anion exchange resin of the polyamine type to remove SiF.sub.6.sup.= ions therefrom is described. The anion exchange resin may be regenerated with aqueous NaOH.

REFERENCES:
patent: 2341907 (1944-02-01), Cheetham et al.
patent: 2504695 (1950-04-01), Jukkola et al.
patent: 4056605 (1977-11-01), Vulikh et al.
Book "Ion Exchange Separations in Analytical Chemistry", by Olaf Samuelson, 1963, pp. 73, 74, 310, 312, J. Wiley & Sons, N.Y.

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