Purification of effluent gases

Glass manufacturing – Processes – Repairing or cleaning of apparatus; or batch dust prevention...

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55 99, 55474, 55479, 34182, 422159, 422176, 422285, 422903, 252629, 252630, 65335, 65347, C03B 300

Patent

active

046522891

ABSTRACT:
The disclosure describes a method and a system for treating gaseous effluents to remove impurities therefrom, these gaseous effluents flowing out from a high temperature reactor, into which a particulate material is being fed. The method comprises directing the flow of gaseous effluents counter-currently through the particulate material which is fed into the reactor, and independently controlling the particulate material feed rate and the velocity of the gaseous effluents so that particles in the gas feed are substantially all trapped by the particulate feed material and are returned to the high temperature reactor. Volatile materials may also be condensed on the particulate feed material. The purified gaseous effluents are then allowed to exit. A system for carrying out this method is also disclosed.

REFERENCES:
patent: 1085712 (1914-02-01), Vadner
patent: 2321015 (1943-06-01), Davis
patent: 2897918 (1959-08-01), Schlotthauer et al.
patent: 3023836 (1962-03-01), Kasbohm et al.
patent: 4153411 (1979-05-01), Isheim
patent: 4358304 (1982-11-01), Froberg

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